Extreme ultraviolet light source apparatus

ABSTRACT

An EUV light source apparatus by which detachment of a chamber or a part of the chamber, movement to a maintenance area, and highly accurate placement relative to projection optics can be performed easily for maintenance of the EUV light source apparatus. The EUV light source apparatus is an apparatus for generating plasma by applying a laser beam to a target material within a chamber and entering EUV light radiated from the plasma into projection optics of exposure equipment, and includes a positioning mechanism for positioning the chamber or a maintenance unit of the chamber in a predetermined location where an optical axis of the collected extreme ultraviolet light and an optical axis of the projection optics of the exposure equipment are aligned, and a movement mechanism for moving the chamber or the maintenance unit of the chamber between the predetermined location and a maintenance area.

CROSS-REFERENCE TO RELATED APPLICATIONS

This application is a Continuation of U.S. Ser. No. 12/543,582 filedAug. 19, 2009, which claims priority from Japanese Patent ApplicationNo. 2008-220892 filed on Aug. 29, 2008. The subject matter of each isincorporated herein by reference in entirety.

BACKGROUND OF THE INVENTION

1. Field of the Invention

The present invention relates to an extreme ultraviolet (EUV) lightsource apparatus to be used as a light source of exposure equipment.

2. Description of a Related Art

In recent years, as semiconductor processes become finer,photolithography has been making rapid progress toward finerfabrication. In the next generation, microfabrication at 70 nm to 45 nm,further, microfabrication at 32 nm and beyond will be required.Accordingly, in order to fulfill the requirement for microfabrication at32 nm and beyond, for example, exposure equipment is expected to bedeveloped by combining an EUV light source for generating EUV lighthaving a wavelength of about 13 nm and reduced projection reflectiveoptics.

As the EUV light source, there are three kinds of light sources, whichinclude an LPP (laser produced plasma) light source using plasmagenerated by applying a laser beam to a target (hereinafter, alsoreferred to as “LPP type EUV light source apparatus”), a DPP (dischargeproduced plasma) light source using plasma generated by discharge, andan SR (synchrotron radiation) light source using orbital radiation.Among them, the LPP light source has advantages that extremely highintensity close to black body radiation can be obtained because plasmadensity can be considerably made larger, that the light emission of onlythe necessary waveband can be performed by selecting the targetmaterial, and that an extremely large collection solid angle of 2πsteradian can be ensured because it is a point light source havingsubstantially isotropic angle distribution and there is no structuresuch as electrodes surrounding the light source. Therefore, the LPPlight source is considered to be predominant as a light source for EUVlithography, which requires power of more than several tens of watts.

In the LPP type EUV light source apparatus, EUV light is generated onthe following principle. That is, by supplying a target material into avacuum chamber by using a nozzle and applying a laser beam to the targetmaterial, the target material is excited and turned into plasma. Variouswavelength components including extreme ultraviolet (EUV) light areradiated from the plasma generated in this manner. Then, a desiredwavelength component (e.g., 13.5 nm) among them is selectively reflectedand collected by using a collector mirror, and outputted to an exposureunit (projection optics). For example, as a collector mirror forcollecting EUV light having a wavelength near 13.5 nm, a mirror having areflecting surface on which molybdenum (Mo) and silicon (Si) thin filmsare alternately stacked is used. Typically, the number of stacked Mo/Sithin films is from sixty to several hundreds.

As a related technology, Japanese Patent Application PublicationJP-P2006-108686A discloses a lithography apparatus for applying EUVlight to a virtual light source point of projection optics in alignmentwith an optical axis of the projection optics by providing an obliqueincidence mirror within an EUV light source apparatus (radiation unit).

However, in JP-P2006-108686A, loss in EUV light intensity is caused byproviding the oblique incidence mirror. Generally, the reflectance ofEUV light by a mirror is about 60%, and therefore, the use efficiency ofEUV light becomes lower by about 60% at each time one mirror is added.

Further, U.S. Patent Application Publication US 2006/0146413 A1discloses a lithographic apparatus for applying EUV light to a virtuallight source point of projection optics in alignment with an opticalaxis of the projection optics by placing an EUV light source apparatusobliquely relative to the direction of gravitational force. According toUS 2006/0146413 A1, the number of reflection mirrors is reduced by onethan that in JP-P2006-108686A, and therefore, the use efficiency of EUVlight can be improved.

However, when the EUV light source apparatus is obliquely placed as inUS 2006/0146413 A1, detachment of a chamber or a part of the chamber,movement to a maintenance area, and highly accurate placement relativeto the projection optics become difficult in the case of maintenance ofthe EUV light source apparatus.

SUMMARY OF THE INVENTION

The present invention has been achieved in view of the above-mentionedproblems. A purpose of the present invention is to provide an extremeultraviolet light source apparatus by which detachment of a chamber or apart of the chamber, movement to a maintenance area, and highly accurateplacement relative to projection optics can be performed easily formaintenance of the EUV light source apparatus.

In order to accomplish the above-mentioned purpose, an extremeultraviolet light source apparatus according to one aspect of thepresent invention is an apparatus for generating plasma by applying alaser beam to a target material and entering extreme ultraviolet lightradiated from the plasma into projection optics of exposure equipment,and the apparatus includes: a chamber in which the extreme ultravioletlight is generated; a target supply unit for supplying the targetmaterial into the chamber; a driver laser for applying the laser beam tothe target material supplied by the target supply unit to generate theplasma; a collector mirror for collecting the extreme ultraviolet lightradiated from the plasma; a positioning mechanism for positioning atleast a part of the chamber in a predetermined location where an opticalaxis of the collected extreme ultraviolet light and an optical axis ofthe projection optics of the exposure equipment are aligned with eachother; and a movement mechanism for moving at least the part of thechamber positioned in the predetermined location between thepredetermined location and a maintenance area.

According to the present invention, since the positioning mechanism forpositioning the chamber or a part of the chamber requiring maintenancein the predetermined location and the movement mechanism for moving thechamber or the part of the chamber between the predetermined locationand the maintenance area are provided, detachment of the chamber or thepart of the chamber, movement to the maintenance area, and highlyaccurate placement relative to the projection optics can be performedeasily for maintenance of the EUV light source apparatus.

BRIEF DESCRIPTION OF THE DRAWINGS

FIGS. 1A and 1B are a plan view and a side view showing an overallconfiguration of exposure equipment including an extreme ultraviolet(EUV) light source apparatus according to one embodiment of theinvention;

FIG. 2 is a schematic diagram showing an outline of a chamber andperipheral devices forming the EUV light source apparatus;

FIGS. 3A and 3B are a plan view and a side view showing a first examplerelated to a movement mechanism and a positioning mechanism of the EUVlight source apparatus;

FIGS. 4A and 4B are a plan view and a side view showing a second examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus;

FIGS. 5A and 5B are a plan view and a side view showing a third examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus;

FIGS. 6A and 6B are a plan view and a side view showing a fourth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus;

FIGS. 7A and 7B are a plan view and a side view showing a fifth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus;

FIGS. 8A and 8B are a plan view and a side view showing a sixth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus;

FIGS. 9A-9C are a plan view, a side view, and a rear view showing aseventh example related to the movement mechanism and the positioningmechanism of the EUV light source apparatus;

FIGS. 10A and 10B are a plan view and a side view showing an eighthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 11A and 11B are a plan view and a side view showing a ninthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 12A and 12B are a plan view and a side view showing a tenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 13A and 13B are a plan view and a side view showing an eleventhexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 14A and 14B are a plan view and a side view showing a twelfthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 15A and 15B are a plan view and a side view showing a thirteenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIGS. 16A and 16B are a plan view and a side view showing a fourteenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus;

FIG. 17 is a rear view showing a fifteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 18 is a rear view showing a sixteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 19 is a rear view showing a seventeenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 20 is a rear view showing an eighteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 21 is a rear view showing a nineteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 22 is a rear view showing a twentieth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 23 is a rear view showing a twenty-first example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 24 is a rear view showing a twenty-second example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 25 is a rear view showing a twenty-third example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 26 is a rear view showing a twenty-fourth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 27 is a rear view showing a twenty-fifth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 28 is a rear view showing a twenty-sixth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 29 is a rear view showing a twenty-seventh example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 30 is a rear view showing a twenty-eighth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus;

FIG. 31 is a side view showing a twenty-ninth example related to aconnection part between the EUV light source apparatus and projectionoptics;

FIGS. 32A and 32B are a plan view and a side view showing a thirtiethexample related to a configuration in which only a part of the chamberof the EUV light source apparatus is moved; and

FIGS. 33A and 33B are a plan view and a side view showing a thirty-firstexample related to the configuration in which only a part of the chamberof the EUV light source apparatus is moved.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

Hereinafter, preferred embodiments of the present invention will beexplained in detail by referring to the drawings. The same referencenumerals are assigned to the same component elements and the descriptionthereof will be omitted.

FIGS. 1A and 1B are a plan view and a side view showing an overallconfiguration of exposure equipment including an extreme ultraviolet(EUV) light source apparatus according to one embodiment of theinvention. The exposure equipment includes an EUV light source apparatus1 and projection optics 20.

The EUV light source apparatus 1 employs a laser produced plasma (LPP)system for generating EUV light by applying a laser beam to a targetmaterial for excitation. As shown in FIGS. 1A and 1B, the EUV lightsource apparatus 1 has a chamber 10 in which EUV light is generated, amovement mechanism 60, and a positioning mechanism 70. The chamber 10 isa vacuum chamber in which extreme ultraviolet light is generated.

FIG. 2 is a schematic diagram showing an outline of the chamber andperipheral devices forming the EUV light source apparatus. The EUV lightsource apparatus 1 has a droplet generator 11, a droplet catcher 16, adriver laser 30, and a flexible pipe 92 as shown in FIG. 2 in additionto the chamber 10, the movement mechanism 60, and the positioningmechanism 70 as shown in FIGS. 1A and 1B.

The droplet generator 11 is a unit for supplying a target material oftin (Sn), lithium (Li), or the like to be used for generating EUV lightinto the chamber 10 via a target nozzle 12. Here, the droplet generator11 corresponds to a target supply unit for supplying the target materialinto the chamber. Among the supplied target material, the unnecessarymaterial, to which the laser beam has not been applied, is collected bythe droplet catcher 16.

The state of the target material may be solid, liquid, or gas, and thetarget material may be supplied to a space within the chamber 10 in anyknown form such as continuous flow (target jet) or droplets. Forexample, when a melted metal of tin (Sn) is used as the target material,the droplet generator 11 includes a heater for melting Sn, a compressedgas cylinder for supplying a high-purity Ar gas for injecting the meltedmetal Sn, a mass flow controller, a target nozzle, and so on. Further,in the case where droplets are generated, a vibrating unit such as apiezoelectric element is added to the target nozzle.

The driver laser 30 is a master oscillator power amplifier type laserapparatus for generating a driving laser beam to be used for excitationof the target material. The laser beam generated by the driver laser 30is focused via a laser beam focusing optics 35 including at least onelens and/or at least one mirror and a laser beam introduction chamberwindow 34 for passing the laser beam into the chamber 10, so as to forma focal point on the trajectory of the target material within thechamber 10. When the laser beam is applied to the target material,plasma is generated, and light having various wavelengths is radiatedfrom it.

Within the chamber 10, an EUV collector mirror 15 is provided. Thereflection surface of the EUV collector mirror 15 is coated with amultilayer film that reflects EUV light having a specific wavelengthcomponent (e.g., 13.5 nm) among the light having various wavelengthsradiated from the plasma, at high reflectance. The reflection surface ofthe EUV collector mirror 15 has an ellipsoidal shape. The EUV collectormirror 15 is provided such that the first focal point of the ellipse islocated at a plasma emission point (PP), and the EUV light is focused onthe second focal point of the ellipse as an intermediate focus point(IF).

The flexible pipe 92 for allowing the EUV light emitted from the EUVcollector mirror 15 to enter the projection optics 20 is connectedbetween the chamber 10 and the projection optics 20. The flexible pipe92 will be described later in the explanation of FIG. 31.

Referring to FIGS. 1A and 1B again, the projection optics 20 has a maskradiation unit 21 for illumination of a mask, and a workpiece radiationunit 22 for projection exposure of the mask image on a workpiece such asa wafer. The mask radiation unit 21 applies the EUV light entering fromthe EUV light source apparatus 1 onto a mask pattern of a mask table MTvia reflection optics. The workpiece radiation unit 22 focuses the EUVlight reflected from the mask table MT on the workpiece (semiconductorwafer or the like) disposed on a workpiece table WT via reflectionoptics. Then, the mask table MT and the workpiece table WT are moved inparallel at the same time, and the mask pattern is transcribed to theworkpiece.

The positioning mechanism 70 includes a chamber support 74 a conformedto the shape of the chamber 10. The chamber support 74 a holds thechamber 10 in a position oblique relative to the direction ofgravitational force such that the optical axis of the EUV light emittedfrom the EUV collector mirror 15 is aligned with the optical axis of theprojection optics 20. Since the chamber support 74 a is conformed to thechamber 10, the chamber 10 is fit in the chamber support 74 a, andthereby, the chamber 10 can be properly held in the posture in which theoptical axis of the EUV light emitted from the EUV collector mirror 15is aligned with the optical axis of the projection optics 20.

The positioning mechanism 70 positions the chamber support 74 a suchthat the chamber 10 is positioned in a predetermined location where theoptical axis of the EUV light emitted from the EUV collector mirror 15is aligned with the optical axis of the projection optics 20. Thedetails of the configuration of positioning the chamber support 74 awill be described later, and various configurations such as stoppers,positioning pins, or six-axis stage may be used. In FIGS. 1A and 1B, thestate in which the chamber 10 is positioned in the predeterminedlocation in alignment with the optical axis of the projection optics 20together with the chamber support 74 a is shown by solid lines.

The movement mechanism 60 is a mechanism of moving the chamber 10between the predetermined location where the chamber 10 is positioned bythe positioning mechanism 70 and a maintenance area in which maintenancecan be done. The details of the movement mechanism 60 will be describedlater, and various configurations such as rails and wheels, a crane, andan air generator may be used. In FIGS. 1A and 1B, the state in which thechamber 10 is moved to the maintenance area together with the chambersupport 74 a is shown by broken lines.

In the configuration as described above, according to the embodiment,the EUV light source apparatus 1 can be placed in an oblique conditionwith high accuracy such that the optical axis of the EUV light emittedfrom the EUV collector mirror 15 is aligned with the optical axis of theprojection optics 20 of the exposure equipment. On the other hand, atmaintenance of the chamber 10 of the EUV light source apparatus 1, thechamber 10 can be detached from the projection optics 20 in safety.Further, after maintenance of the chamber 10, the chamber 10 can beplaced with high accuracy relative to the projection optics 20.Furthermore, detachment and placement for maintenance of the chamber 10can be performed in a short time.

Next, a specific configuration example of the EUV light source apparatusof the above-mentioned embodiment will be explained.

FIGS. 3A and 3B are a plan view and a side view showing a first examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 3A and 3B, the EUV light source apparatus 1 accordingto the first example includes, as the movement mechanism 60, twoparallel rails 61 placed on the floor. Wheels 81 a are attached to thechamber support 74 a. As the wheels 81 a roll along the rails 61, thechamber support 74 a moves together with the chamber 10. In addition,sliding bearings may be used in place of the wheels 81 a. Further, alsoin the following explanation, sliding bearings may be used in place ofthe wheels 81 a.

Furthermore, the EUV light source apparatus 1 according to the firstexample includes, as the positioning mechanism 70, a positioning block71 a placed in a location at the same side as the projection optics 20,and a fixing plate 72 placed in a location at the opposite side to theprojection optics 20. Members for fixing the chamber support 74 a incontact therewith are provided on the fixing plate 72.

The positioning block 71 a is constantly placed on the rails 61, andregulates the movement of the chamber support 74 a toward the projectionoptics 20. The fixing plate 72 is placed on the rails 61 under thecondition that the chamber support 74 a is pressed against thepositioning block 71 a, and secured by bolts 73 a or pins to regulatethe movement of the chamber support 74 a toward the opposite side to theprojection optics 20.

By the positioning block 71 a and the fixing plate 72, the movement ofthe chamber support 74 a and the chamber 10 along the travelingdirection on the rails 61 is regulated, and the chamber 10 is positionedin the predetermined location in alignment with the optical axis of theprojection optics 20. At maintenance of the chamber 10, the bolts 73 aand the fixing plate 72 are detached and the chamber support 74 a ismoved to the location as shown by the broken lines in FIGS. 3A and 3B.

In the embodiment, the rails 61 are provided on the floor and the wheels81 a are provided to the chamber support 74 a. However, the invention isnot limited to that, and the wheels may be provided to the floor and therails may be provided on the chamber support 74 a. In this case, forexample, four wheels are placed on the floor and rails are placed underthe chamber support 74 a, and thereby, movement and positioning can beeasily performed.

FIGS. 4A and 4B are a plan view and a side view showing a second examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 4A and 4B, in the EUV light source apparatus 1according to the second example, as the movement mechanism, wheels 81 aare provided to the chamber support 74 a and guide rails 64 a areprovided on a floor (or a base plate surface within an apparatus),respectively. The chamber support 74 a on which the chamber 10 ismounted moves as the wheels 81 a roll on the floor. In the first exampleas shown in FIGS. 3A and 3B, the rails 61 on the floor are provided fromthe positioning block 71 a through the fixing location of the fixingplate 72 to the maintenance area. On the other hand, in the secondexample, the guide rails 64 a are provided only from the location of thepositioning block 71 a to the fixing location of the fixing plate 72,and the guide rails 64 a are not provided to the maintenance area.

Therefore, in the second example, the chamber support 74 a, on which thechamber 10 is mounted, can travel without regulation of the guide rails64 a in the maintenance area, while its traveling path is regulated bythe guide rails 64 a between the location of the positioning block 71 aand the fixing location of the fixing plate 72. The chamber 10 in thelongitudinal direction of the guide rails 64 a is positioned by thepositioning block 71 a in contact with the front end of the chambersupport 74 a and the fixing plate 72 in contact with the rear end of thechamber support 74 a, in the same way as in the first example.Alternatively, instead of the positioning block 71 a, the samepositioning member as the fixing plate 72 may be fixed in the locationin contact with the front end of the chamber support 74 a.

According to the second example, the degree of freedom of movement ofthe chamber 10 in the maintenance area can be improved, and handling ofthe chamber 10 can be facilitated. In addition, as the configuration forregulating the traveling path of the chamber support 74 a by the guiderails 64 a, grooves for receiving the guide rails 64 a may be formed onthe lower surface of the chamber support 74 a. Alternatively, as shownin FIG. 18, which will be explained later, protrusions may be providedon the lower surface of the chamber support 74 a, and grooves forreceiving the protrusions may be formed in the guide rails 64 a.

FIGS. 5A and 5B are a plan view and a side view showing a third examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 5A and 5B, in the EUV light source apparatus 1according to the third example, as the movement mechanism, wheels 81 aare provided to the chamber support 74 a. The chamber support 74 a, onwhich the chamber 10 is mounted, moves as the wheels 81 a roll on thefloor. In the second example as shown in FIGS. 4A and 4B, the guiderails 64 a are provided from the location of the positioning block 71 ato the fixing location of the fixing plate 72. On the other hand, in thethird example, guide pieces 64 b are provided only near the locationwhere the positioning block 71 a is placed, and the guide pieces 64 bare not provided to the fixing location of the fixing plate 72 and themaintenance area.

Therefore, in the third example, the chamber support 74 a, on which thechamber 10 is mounted, can travel without regulation of the guide pieces64 b. The guide pieces 64 b position the chamber support 74 a in adirection perpendicular to the traveling direction by the wheels 81 a.Positioning of the chamber support 74 a in a direction in parallel tothe raveling direction by the wheels 81 a is performed by thepositioning block 71 a in contact with the front end of the chambersupport 74 a and the fixing plate 72 in contact with the rear end of thechamber support 74 a. Alternatively, instead of the positioning block 71a, the same positioning member as the fixing plate 72 may be fixed inthe location in contact with the front end of the chamber support 74 a.

According to the third example, the degree of freedom of movement of thechamber 10 except in the case requiring positioning can be improved, andhandling of the chamber 10 can be facilitated. Note that, in order toposition the chamber 10 by using the guide pieces 64 b, grooves forreceiving the guide pieces 64 b may be formed in the chamber support 74a with the chamber 10 mounted thereon, for example.

FIGS. 6A and 6B are a plan view and a side view showing a fourth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 6A and 6B, the EUV light source apparatus 1 accordingto the fourth example is different from the first example as shown inFIGS. 3A and 3B in that the chamber 10 moves in a direction crossing thedirection toward the projection optics 20. Accordingly, in the fourthexample, the rails 61 are placed in the direction crossing the directiontoward the projection optics 20. Further, positioning of the chamber 10in the direction crossing the direction toward the projection optics 20is performed by the positioning block 71 a and the fixing plate 72. Therest of the configuration is the same as that in the first example, andthe chamber support 74 a moves together with the chamber 10 as thewheels 81 a roll along the rails 61. Although the example in which thechamber 10 moves to the right of the projection optics 20 (downwards inFIG. 6A) is shown, the chamber may move to the left (upwards in FIG.6A).

FIGS. 7A and 7B are a plan view and a side view showing a fifth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 7A and 7B, the EUV light source apparatus 1 accordingto the fifth example is different from the second example as shown inFIGS. 4A and 4B in that the chamber 10 moves in a direction crossing thedirection toward the projection optics 20. Accordingly, in the fifthexample, the guide rails 64 a are placed in the direction crossing thedirection toward the projection optics 20. Further, positioning of thechamber 10 in the direction crossing the direction toward the projectionoptics 20 is performed by the positioning block 71 a and the fixingplate 72. The rest of the configuration is the same as that of thesecond example. The chamber 10 moves in a direction in parallel to thelongitudinal direction of the guide rails 64 a, and thereby, movesbetween a predetermined direction in contact with the positioning block71 a and the maintenance area where guide rails 64 a are not provided.Although the example in which the chamber 10 moves to the right of theprojection optics 20 (downwards in FIG. 7A) is shown, the chamber maymove to the left (upwards in FIG. 7A).

FIGS. 8A and 8B are a plan view and a side view showing a sixth examplerelated to the movement mechanism and the positioning mechanism of theEUV light source apparatus.

As shown in FIGS. 8A and 8B, the EUV light source apparatus 1 accordingto the sixth example is different from the third example as shown inFIGS. 5A and 5B in that the chamber 10 moves in a direction crossing thedirection toward the projection optics 20. Accordingly, in the sixthexample, positioning of the chamber 10 in the direction crossing thedirection toward the projection optics 20 is performed by thepositioning block 71 a and the fixing plate 72. The rest of theconfiguration is the same as that of the third example. The chamber 10moves in the direction crossing the direction toward the projectionoptics 20, and thereby, moves between a predetermined direction incontact with the positioning block 71 a and the maintenance area.Although the example in which the chamber 10 moves to the right of theprojection optics 20 (downwards in FIG. 8A) is shown, the chamber maymove to the left (upwards in FIG. 8A).

FIGS. 9A-9C are a plan view, a side view, and a rear view showing aseventh example related to the movement mechanism and the positioningmechanism of the EUV light source apparatus.

As shown in FIGS. 9A-9C, the EUV light source apparatus 1 according tothe seventh example includes, as the movement mechanism 60, a crane 62with wheels. The crane 62 hoists the chamber 10 and the wheels roll onthe floor, and thereby, the chamber 10 is moved. The chamber 10 isprovided with a hanging ring for hoisting by the crane 62. The hangingring is provided in a location just above the center of gravity of thechamber 10 under the condition that the chamber 10 is positioned in apredetermined location where the optical axis of EUV light emitted fromthe EUV collector mirror 15 is aligned with the optical axis of theprojection optics 20. Thereby, sudden inclination of the chamber can beprevented when the chamber is hoisted by the crane 62.

Further, the EUV light source apparatus 1 according to the seventhexample includes, as the positioning mechanism 70, a positioning stage74 b fixed on the floor. The positioning stage 74 b holds the chamber 10in a posture oblique relative to the gravity direction such that theoptical axis of EUV light emitted from the EUV collector mirror 15 isaligned with the optical axis of the projection optics 20. Since thepositioning stage 74 b is conformed to the shape of the chamber 10, whenthe chamber 10 is fitted in the positioning stage 74 b, the chamber 10can be correctly held in a posture in which the optical axis of EUVlight emitted from the EUV collector mirror 15 is aligned with theoptical axis of the projection optics 20. In addition, the chamber 10may be positioned on the positioning stage 74 b by providing positioningpins on the positioning stage 74 b, or may be fixed onto the positioningstage 74 b with bolts. At maintenance of the chamber 10, the chamber 10is moved by the crane 62 to the location as shown by broken lines inFIGS. 9A and 9B.

The crane 62 may be permanently installed or brought in only formaintenance. Although the wheels of the crane 62 travel on the floor,the present invention is not limited to that, but rails may be providedon the floor for the wheels to travel on the rails. Furthermore,although the crane 62 is shown as an example of the movement mechanism60, the present invention is not limited to that, but the chamber 10 maybe lifted by a lifter and moved to the maintenance area. Moreover,although the positioning stage 74 b fixed on the floor is shown as anexample of the positioning mechanism 70, the present invention is notlimited to that, but a six-axis stage for high-accuracy adjustment ofthe optical axis of the chamber 10 may be used.

FIGS. 10A and 10B are a plan view and a side view showing an eighthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 10A and 10B, the EUV light source apparatus 1according to the eighth example includes, as the movement mechanism 60,an air generating unit 63 a provided on the lower surface of a chambersupport 74 c. The air generating unit 63 a ejects air to the floor(installation surface) from the lower surface of the air generating unit63 a by using a fan or the like to slightly raise the chamber support 74c from the floor for moving the chamber support 74 c with low friction.

Further, the EUV light source apparatus 1 according to the eighthexample includes, as the positioning mechanism 70, two positioning pins75 a provided on the floor. The chamber support 74 c is formed withnotches for receiving the positioning pins 75 a. When the chambersupport 74 c is moved along the floor toward the projection optics 20and the positioning pins 75 a are pressed against the notches of thechamber support 74 c, the chamber support 74 c is positioned togetherwith the chamber 10. The chamber support 74 c is further fixed to thefloor by a bolt 73 b. At maintenance of the chamber 10, the bolt 73 b isdetached, and the chamber support 74 c is moved by the air generatingunit 63 a to the location as shown by the broken lines in FIGS. 10A and10B.

According to the embodiment, the air generating unit 63 a is used sothat the chamber 10 can be moved by a simple configuration, and thechamber 10 can be positioned with high accuracy by using the simplepositioning pins.

Although the two positioning pins 75 a are provided, the presentinvention is not limited to that, but the larger number of positioningpins may be used. Further, for the positioning in the horizontaldirection of the EUV chamber, positioning can be performed if locationsof two points are determined, and therefore, not the positioning pinsbut blocks or plates that can determine the locations of two points maybe used.

FIGS. 11A and 11B are a plan view and a side view showing a ninthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 11A and 11B, the EUV light source apparatus 1according to the ninth example includes, as the positioning mechanism70, an exposure equipment reference member 76 that also serves as areference member for positioning the projection optics 20. That is, theexposure equipment reference member 76 is used as the reference forpositioning the projection optics 20 and also used as the reference forpositioning the chamber 10. The exposure equipment reference member 76is a large member having two plate parts orthogonal to each other withan L-shaped section in the thickness direction. One plate part positionsthe projection optics 20 and the other plate part positions the chamber10. The positioning of the chamber 10 is performed via the movementmechanism 60 and a positioning block 71 b placed and fixed onto theexposure equipment reference member 76.

According to the configuration, the positioning accuracy of the chamber10 relative to the projection optics 20 can be improved and variance inthe positioning accuracy depending on the installation location can bereduced.

The configuration of the movement mechanism 60 is not specificallylimited, but a configuration described in the other examples may beused. The positioning mechanism 70 is not limited to the positioningblock 71 b, but the mechanism described in the other examples may beused. The exposure equipment reference member 76 is not limited to thelarge member with the L-shaped section, but a member as reference suchas small plates, pins, or the like may be placed in the projectionoptics 20, and the movement mechanism and the positioning mechanism ofthe chamber 10 may be placed with reference to the reference member.

FIGS. 12A and 12B are a plan view and a side view showing a tenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 12A and 12B, the EUV light source apparatus 1according to the tenth example includes a laser beam introduction duct31 for introducing a laser beam from the driver laser 30 providedoutside of the chamber 10 into the chamber 10. The laser beamintroduction duct 31 includes a laser beam high-reflection mirror 32,and a laser beam introduction flexible pipe 33. Further, the chamber 10is provided with a laser beam introduction chamber window 34 fortransmitting the laser beam, and a laser beam focusing off-axisparaboloidal mirror 14 for focusing the laser beam on the targetmaterial.

The laser beam emitted from the driver laser 30 passes through the laserbeam introduction duct 31, is reflected by the laser beamhigh-reflection mirror 32 at an right angle, passes through the laserbeam introduction flexible pipe 33, is transmitted through the laserbeam introduction chamber window 34, and radiated into the chamber 10.Further, the laser beam is reflected by the laser beam focusing off-axisparaboloidal mirror 14, passes through an opening of the EUV collectormirror 15, and is focused to the target material.

At maintenance of the chamber 10, the laser beam introduction flexiblepipe 33 is detached, and the chamber 10 is moved by the movementmechanism 60 to the location as shown by the broken lines in FIGS. 12Aand 12B.

The embodiment is characterized in that the laser beam introduction duct31 and the laser beam introduction flexible pipe 33 are provided outsidethe track on which the chamber is moved by the movement mechanism 60.Therefore, the laser beam introduction duct 31 and the laser beamintroduction flexible pipe 33 are not an obstacle of the maintenance ofthe chamber 10. Further, even when the maintenance of the chamber 10 isdone, the optical axis of the laser beam is not changed. Thus, if thechamber 10 is correctly positioned, it can be correctly positionedrelative to both the optical axis of the laser beam and the optical axisof the projection optics 20.

FIGS. 13A and 13B are a plan view and a side view showing an eleventhexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 13A and 13B, the EUV light source apparatus 1according to the eleventh example includes a vacuum evacuation pump 41and a vacuum evacuation pump flexible pipe 43 outside of the chamber 10in addition to the configuration of the tenth example. Further, thechamber 10 is provided with a gate valve 44 connected to the vacuumevacuation pump flexible pipe 43.

The vacuum evacuation pump 41 evacuates the air within the chamber 10via the gate valve 44 and the vacuum evacuation pump flexible pipe 43,and thereby, provides a good environment for transmission of EUV light.Further, since the vacuum evacuation pump flexible pipe 43 is provided,the vibration of the vacuum evacuation pump 41 can be prevented frompropagating to the chamber 10.

At maintenance of the chamber 10, the gate valve 44 is closed, and thevacuum evacuation pump flexible pipe 43 and the laser beam introductionflexible pipe 33 are detached, and the chamber 10 is moved by themovement mechanism 60 to the location as shown by the broken lines inFIGS. 13A and 13B.

The embodiment is characterized in that the vacuum evacuation pump 41and the vacuum evacuation pump flexible pipe 43 are provided outside thetrack on which the chamber is moved by the movement mechanism 60.Therefore, the vacuum evacuation pump 41 and the vacuum evacuation pumpflexible pipe 43 are not an obstacle of the maintenance of the chamber10.

FIGS. 14A and 14B are a plan view and a side view showing a twelfthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 14A and 14B, the EUV light source apparatus 1according to the twelfth example includes a pair of magnets 51 and 52placed such that the magnetic field direction is along the horizontaldirection, and magnet fixing stages 53 and 54 for fixing the magnets,outside of the chamber 10 in addition to the configuration of theeleventh example. The pair of magnets 51 and 52 are superconductingelectromagnets for trapping charged particles radiated from plasmagenerated within the chamber 10 and preventing deterioration of the EUVcollector mirror 15, and have large weights for generating a strongmagnetic field.

At maintenance of the chamber 10, a gate valve 44 a is closed, and avacuum evacuation pump flexible pipe 43 a and the laser beamintroduction flexible pipe 33 are detached, and the chamber 10 is movedby the movement mechanism 60 to the location as shown by the brokenlines in FIGS. 14A and 14B. Here, it is not necessary to move themagnets 51 and 52 and the magnet fixing stages 53 and 54.

The embodiment is characterized in that the pair of magnets 51 and 52are provided separably from the chamber 10, outside the track on whichthe chamber is moved by the movement mechanism 60. Therefore, themagnets 51 and 52 are not obstacles of the maintenance of the chamber10.

In the embodiment, the vacuum evacuation pump 41 is provided outside thetrack on which the chamber is moved by the movement mechanism 60 as isthe case of the eleventh example. However, the pipe, which includes thevacuum evacuation pump flexible pipe 43 a, for the vacuum evacuationpump 41 and the gate valve 44 a are provided in an area partiallyoverlapping the track on which the chamber is moved by the movementmechanism 60. At maintenance of the chamber 10, they can be retracted tothe outside of the track on which the chamber is moved by the movementmechanism 60 by bending the vacuum evacuation pump flexible pipe 43 a.

FIGS. 15A and 15B are a plan view and a side view showing a thirteenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 15A and 15B, in the EUV light source apparatus 1according to the thirteenth example, the chamber 10 moves in a directioncrossing the direction toward the projection optics 20. Accordingly,wheels 55 are provided to a magnet fixing stage 54 a with a magnet 52 amounted thereon so that the magnet 52 a existing on the movement trackof the chamber 10 can be retracted to the outside of the movement trackof the chamber 10. In the thirteenth example, as the wheels 55 roll onthe floor, the magnet fixing stage 54 a can be moved in the directioncrossing the movement track of the chamber 10. The configuration formoving and positioning the chamber 10 is the same as that of the fifthexample as shown in FIGS. 7A and 7B. Although the example in which themagnet 52 a is retracted to the outside of the movement track of thechamber 10 is shown, in the case where the vacuum evacuation pump or theother large parts are on the movement track of the chamber 10, they maybe retracted. Further, although the example in which the magnet 52 a isretracted and the chamber 10 is moved to the right of the projectionoptics 20 (downwards in FIG. 15A) is shown, the magnet 51 may beretracted and the chamber 10 may be moved to the left (upwards in FIG.15A). Furthermore, the mechanism for moving the magnet 52 a is notlimited to the wheels 55, but rails or sliding bearings may be used.

FIGS. 16A and 16B are a plan view and a side view showing a fourteenthexample related to the movement mechanism and the positioning mechanismof the EUV light source apparatus.

As shown in FIGS. 16A and 16B, in the EUV light source apparatus 1according to the fourteenth example, the chamber 10 moves in a directioncrossing the direction toward the projection optics 20. Accordingly, arotational shaft 56 and wheels 57 are provided to a magnet fixing stage54 b with a magnet 52 b mounted thereon so that the magnet 52 b existingon the movement track of the chamber 10 can be retracted to the outsideof the movement track of the chamber 10. In the fourteenth example, asthe magnet fixing stage 54 b is rotated around the rotational axis 56,the magnet fixing stage 54 b can be moved. The configuration for movingand positioning the chamber 10 is the same as that of the fifth exampleas shown in FIGS. 7A and 7B. Although the example in which the magnet 52b is retracted to the outside of the movement track of the chamber 10 isshown, in the case where the vacuum evacuation pump or the other largeparts are on the movement track of the chamber 10, they may beretracted. Further, although the example in which the magnet 52 b isretracted and the chamber 10 is moved to the right of the projectionoptics 20 (downwards in FIG. 16A) is shown, the magnet 51 may beretracted and the chamber may be moved to the left (upwards in FIG.16A). Furthermore, in place of the wheels 57, sliding bearings may beused.

FIG. 17 is a rear view showing a fifteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 17, the EUV light source apparatus 1 according to thefifteenth example is similar to the first example in that the EUV lightsource apparatus 1 includes two parallel rails 61 a as the movementmechanism 60, and the chamber 10 moves as wheels 81 a roll along therails 61 a. On the other hand, the fifteenth example is different fromthe first example in that a run-off prevention guide formed with arun-off prevention guide groove 64 is additionally provided in parallelto the rails 61 a, and a run-off prevention piece 84 slides to move inthe run-off prevention guide groove 64 so as to prevent the run-off ofthe chamber 10. The rails 61 a and the run-off prevention guide arefixed onto a movement mechanism installation base 67, and the movementmechanism installation base 67 is fixed to the floor by anchor bolts 68.

As the positioning mechanism to be used in the fifteenth example, thesame configurations as the positioning block 71 a and the fixing plate72 in the first example may be used or the positioning mechanism 70 inthe other examples may be used.

FIG. 18 is a rear view showing a sixteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 18, the EUV light source apparatus 1 according to thesixteenth example is similar to the fifteenth example as shown in FIG.17 in that the chamber 10 moves as wheels 81 a attached to the chamber10 roll, and a guide formed with a guide groove 64 c is provided inparallel to the direction toward the projection optics 20 on a base 67c, and a protrusion 84 a provided on the chamber 10 slides to move inthe guide groove 64 c so as to regulate the traveling path of thechamber. On the other hand, the sixteenth example is different from thefifteenth example in that the wheels 81 a roll not on the rails but onthe base 67 c or the floor. The guide may be provided in the entiretraveling path from the location where the chamber 10 is positioned tothe maintenance area, or may be provided only in a part of the travelingpath.

FIG. 19 is a rear view showing a seventeenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 19, the EUV light source apparatus 1 according to theseventeenth example is different from the sixteenth example as shown inFIG. 18 in that two guides respectively formed with two guide grooves 64c are provided at the outer side than the traveling path of the wheels81 a, and corresponding plural protrusions 84 a are provided at theouter side than the wheels 81 a, and the wheels 81 a are provided at theinner side thereof. The rest of the configuration is the same as that ofthe sixteenth example.

FIG. 20 is a rear view showing an eighteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 20, the EUV light source apparatus 1 according to theeighteenth example is similar to the first example in that the EUV lightsource apparatus 1 includes two parallel rails 61 b as the movementmechanism 60, and the chamber 10 moves as wheels 81 b roll along therails 61 b. On the other hand, the eighteenth example is different fromthe first example in that the run-off of the chamber 10 is prevented byflanges formed on the side surfaces of the wheels 81 b. The rails 61 bare fixed onto the movement mechanism installation base 67, and themovement mechanism installation base 67 is fixed to the floor by theanchor bolts 68.

As the positioning mechanism 70 to be used in the eighteenth example,the same configurations as the positioning block 71 a and the fixingplate 72 in the first example may be used or the positioning mechanism70 in the other examples may be used.

FIG. 21 is a rear view showing a nineteenth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 21, the EUV light source apparatus 1 according to thenineteenth example is similar to the first example in that the EUV lightsource apparatus 1 includes two parallel rails 61 c and 65 as themovement mechanism 60, and the chamber 10 moves as a wheel 81 c rollsalong the rail 61 c and a wheel 85 rolls along the rail 65. On the otherhand, the nineteenth example is different from the first example in thatthe section perpendicular to the longitudinal direction of the rail 65within the rails 61 c and 65 has a convex or concave shape, the sectionalong the diameter of the wheel 85 rolling along the rail 65 has aconcave or convex shape corresponding to the rail 65, and thereby, therun-off of the chamber 10 is prevented. The rails 61 c and 65 are fixedonto the movement mechanism installation base 67 and the movementmechanism installation base 67 is fixed to the floor by the anchor bolts68.

As the positioning mechanism 70 to be used in the nineteenth example,the same configurations as the positioning block 71 a and the fixingplate 72 in the first example may be used or the positioning mechanism70 in the other examples may be used.

FIG. 22 is a rear view showing a twentieth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 22, the EUV light source apparatus 1 according to thetwentieth example is similar to the first example in that the EUV lightsource apparatus 1 includes two parallel slide rails 61 d as themovement mechanism 60 so that the chamber 10 moves. On the slide rails61 d in the twentieth example, slide blocks 81 d are movably provided.Circulating balls are provided between the slide rails 61 d and theslide blocks 81 d, and so-called linear bearings are formed. The slideblocks 81 d are fixed to the chamber 10, and the chamber 10 moves as theslide blocks 81 d move. The slide rails 61 d are fixed onto the movementmechanism installation base 67, and the movement mechanism installationbase 67 is fixed to the floor by anchor bolts 68.

As the positioning mechanism to be used in the twentieth example, thesame configurations as the positioning block 71 a and the fixing plate72 in the first example may be used or the positioning mechanism 70 inthe other examples may be used.

FIG. 23 is a rear view showing a twenty-first example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 23, the EUV light source apparatus 1 according to thetwenty-first example employs rack-and-pinions and the same run-offprevention guide groove as that in the fifteenth example as the movementmechanism 60. That is, onto the movement mechanism installation base 67,two racks 66 a formed by gear-cutting on one surface of each elongatedflat plate and the run-off prevention guide formed with the run-offprevention guide groove 64 are fixed in parallel to one another.Further, circular gears (pinions) 86 a having small diameters andaxially supported by the chamber 10 rotationally move on the racks 66 awhile engaging with the racks 66 a, and the run-off prevention piece 84slides to move in the run-off prevention guide groove 64, and thereby,the run-off of the chamber 10 is prevented. The movement mechanisminstallation base 67 is fixed to the floor by anchor bolts 68.

As the positioning mechanism to be used in the twenty-first example, thesame configurations as the positioning block 71 a and the fixing plate72 in the first example may be used or the positioning mechanism 70 inthe other examples may be used.

FIG. 24 is a rear view showing a twenty-second example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 24, the EUV light source apparatus 1 according to thetwenty-second example is similar to the twenty-first example in that theEUV light source apparatus 1 employs rack-and-pinions as the movementmechanism 60. In the twenty-second example, racks 66 b are of Riggenbachtype having U-shaped sections, and the run-off of pinions 86 b axiallysupported by the chamber 10 is prevented. Therefore, the run-offprevention guide groove 64 and the run-off prevention piece 84 as in thetwenty-first example are not required. The racks 66 b are fixed onto themovement mechanism installation base 67, and the movement mechanisminstallation base 67 is fixed to the floor by the anchor bolts 68.

As the positioning mechanism 70 to be used in the twenty-second example,the same configurations as the positioning block 71 a and the fixingplate 72 in the first example may be used or the positioning mechanism70 in the other examples may be used.

FIGS. 25-29 are rear views showing the twenty-third to twenty-seventhexamples related to the movement mechanism and the positioning mechanismof the EUV light source apparatus, respectively.

As shown in FIGS. 25-29, the EUV light source apparatuses 1 according tothe twenty-third to twenty-seventh examples respectively include thesame configurations of the fifteenth to twentieth and the twenty-secondexamples with respect to the movement mechanism 60. In the fifteenth totwentieth and the twenty-second examples, the wheels 81 a and therun-off prevention piece 84, the wheels 81 b, the wheels 81 c and 85,the slide blocks 81 d, and the pinions 86 b are axially supported by orfixed to the chamber 10. On the other hand, in the twenty-third totwenty-seventh examples, they are axially supported by or fixed to acarriage 87. Further, the chamber 10 is positioned on the carriage 87,and moves to the maintenance area as the carriage 87 moves.

As the positioning mechanisms for positioning the carriage 87 in thetwenty-third to twenty-seventh examples, the same configurations as thepositioning block 71 a and the fixing plate 72 in the first example maybe used or the positioning mechanism 70 in the other examples may beused.

FIG. 30 is a rear view showing a twenty-eighth example related to themovement mechanism and the positioning mechanism of the EUV light sourceapparatus.

As shown in FIG. 30, the EUV light source apparatus 1 according to thetwenty-eighth example includes an air generating unit 63 b, which is thesame as that in the eighth example, on the lower surface of the carriage87. Further, the chamber 10 is positioned on the carriage 87, and movesto the maintenance area as the carriage 87 moves.

Positioning of the carriage 87 is the same as that in the eighth examplein that two or more positioning pins 75 b are used. However, in thetwenty-eighth example, the positioning pins 75 b are provided on a base67 b. The base 67 b is further placed on a movement mechanisminstallation base 67 a via a guide mechanism such as slide rails likethose in the twenty-sixth example. The movement mechanism installationbase 67 a is fixed to the floor by anchor bolts.

According to the configuration, the carriage 87 with the chamber 10mounted thereon moves toward the projection optics 20 together with thebase 67 b by the guide mechanism 69, and is positioned in apredetermined location where the optical axes of the chamber 10 and theprojection optics 20 are aligned with each other.

As the positioning mechanism for positioning the base 67 b in thetwenty-eighth example, the same configurations as the positioning block71 a and the fixing plate 72 in the first example may be used or thepositioning mechanism 70 in the other examples may be used.

FIG. 31 is a side view showing a twenty-ninth example related to aconnection part between the EUV light source apparatus 1 and theprojection optics 20. Both of the interior of the chamber 10 of the EUVlight source apparatus 1 and the interior of the projection optics 20are in a vacuum state or filled with a low-pressure gas for transmittingEUV light (e.g., an inert gas such as Ar or He, or a hydrogen gas,halogen gas, or halogenated hydrogen gas for etching of an adheredmaterial) for use in order to provide good environment for transmittingEUV light. Accordingly, for easy maintenance of the chamber 10, a gatevalve 91 a of the chamber 10 and a gate valve 91 b of the projectionoptics 20 are provided in the connection part located in an optical pathbetween the chamber 10 and the projection optics 20, and a flexible pipe92 is provided between the gate valve 91 a and the gate valve 91 b.Further, in the flexible pipe 92, a shield plate with pinhole 93 formedwith a pinhole therein is fixed to the chamber 10 side. The EUV light isentered into the projection optics 20 through the pinhole. The shieldplate with pinhole 93 prevents the target material or the like withinthe chamber 10 or the above-mentioned low-pressure gas for transmittingEUV light from entering the projection optics 20.

As the movement mechanism and the positioning mechanism, not only themovement mechanisms and the positioning mechanisms described in thefirst to twenty-eighth examples but also any movement mechanism andpositioning mechanism may be used.

At maintenance of the chamber 10, first, the gate valve 91 a of thechamber 10 and the gate valve 91 b of the projection optics 20 arerespectively closed. Then, in the case where the chamber 10 is filledwith a low-pressure reactive gas (e.g., a hydrogen gas, halogen gas, orhalogenated hydrogen gas), the gas is evacuated by a vacuum pump, andthe chamber 10 is filled with an inert gas of nitrogen gas, argon gas,or the like to the degree of atmospheric pressure. Then, the flexiblepipe 92 is detached, and the chamber 10 is moved to the location asshown by the broken lines of FIG. 31 by the movement mechanism 60.

For placement of the chamber 10, through the opposite procedure to theabove-mentioned procedure, first, the chamber 10 is moved toward theprojection optics 20 by the movement mechanism 60, and the chamber 10 ispositioned in the predetermined location where the optical axes of thechamber 10 and the projection optics 20 are aligned with each other bythe positioning mechanism 70. Then, the flexible pipe 92 is connectedbetween the gate valve 91 a and the gate valve 91 b, and the interior ofthe flexible pipe is evacuated to the vacuum state by the vacuumevacuation pump. Then, the gate valve 91 a of the chamber 10 and thegate valve 91 b of the projection optics 20 are respectively opened. Inthis manner, the maintenance of the chamber 10 can be done withoutcontamination of air within the chamber 10 and the projection optics 20.

FIGS. 32A and 32B are a plan view and a side view showing a thirtiethexample related to a configuration in which only a part of the chamber10 of the EUV light source apparatus is moved, and FIGS. 33A and 33B area plan view and a side view showing a thirty-first example related tothe configuration in which only a part of the chamber 10 of the EUVlight source apparatus is moved.

The chamber 10 of the EUV light source apparatus 1 according to thethirtieth example as shown in FIGS. 32A and 32B is separable into amaintenance unit 10 a at the plasma generation part side and anirregular maintenance unit 10 b at the projection optics 20 side. In theembodiment, the large-diameter part near the plasma generation part ofthe chamber 10 is the maintenance unit 10 a, and the tapered partforming the optical path converging from the large-diameter part to theprojection optics 20 side is the irregular maintenance unit 10 b.

Also in the thirty-first example as shown in FIGS. 33A and 33B, thechamber 10 is also separable into a maintenance unit 10 c at the plasmageneration part side and an irregular maintenance unit 10 d at theprojection optics 20 side. The thirty-first embodiment is different fromthe thirtieth embodiment as shown in FIGS. 32A and 32B in that thetapered part of the chamber 10 is separated by a surface perpendicularto the movement direction by the movement mechanism 60, and the part atthe plasma generation part side with respect to the separation surfaceis the maintenance unit 10 c, and the part at the projection optics 20side with respect to the separation surface is the irregular maintenanceunit 10 d. According to the configuration, movement operation of themaintenance unit 10 c to the maintenance area side and the couplingoperation to the irregular maintenance unit 10 d become easier.

As specifically shown in FIGS. 33A and 33B, the maintenance unit 10 a or10 c includes parts requiring regular maintenance such as the dropletgenerator 11, the laser beam focusing off-axis paraboloidal mirror 14,the EUV collector mirror 15, the droplet catcher 16, and a laser beamdumper 17. That is, the droplet generator 11 is the unit for supplying atarget material into the chamber 10, and requires periodical replacementbecause clogging occurs in the target nozzle or the like after a longperiod of use. The laser beam focusing off-axis paraboloidal mirror 14and the EUV collector mirror 15 require periodical replacement becauseits reflectance becomes lower during use by adherence of the targetmaterial, ion etching, or the like. The droplet catcher 16 is a unit forcollecting the target material that has not been turned into plasmathough supplied from the droplet generator 11, and requires periodicalreplacement because it is contaminated by the target material duringuse. The laser beam dumper 17 is a unit for receiving the laser beamapplied for excitation of the target material, and requires periodicalreplacement because the target material within the chamber 10 adheres toit during use.

On the other hand, the irregular maintenance unit 10 b or 10 d does notrequire the frequent maintenance like the maintenance unit 10 a or 10 c.Accordingly, in these embodiments, only the maintenance unit 10 a or 10c can be carried to the maintenance area.

In the joint part between the maintenance unit 10 a or 10 c and theirregular maintenance unit 10 b or 10 d, an O-ring, a metal seal, or thelike is embedded. Further, the maintenance unit 10 a or 10 c and theirregular maintenance unit 10 b or 10 d are united, clamped, and sealedby bolts, clamp, or the like.

As the movement mechanism and the positioning mechanism, not only themovement mechanisms and the positioning mechanisms described in thefirst to twenty-eighth examples but also any movement mechanism andpositioning mechanism may be used. The movement mechanisms and thepositioning mechanisms in the thirtieth and thirty-first examples movesand positions only the maintenance unit 10 a or 10 c of the chamber 10for maintenance.

When the maintenance unit 10 a or 10 c is moved to the maintenance area,first, the chamber 10 is purged by an inert gas such as nitrogen gas orargon gas, and the gas is injected into the chamber 10 up to near theatmospheric pressure. Then, the bolts, clamp, or the like for unitingthe maintenance unit 10 a or 10 c and the irregular maintenance unit 10b or 10 d is detached. Then, the maintenance unit 10 a or 10 c is movedby the movement mechanism 60 to the maintenance area, and the separatedmaintenance unit 10 a or 10 c and irregular maintenance unit 10 b or 10d are respectively closed by plates as lids.

For placement of the maintenance unit 10 a or 10 c, through the oppositeprocedure to the above-mentioned procedure, first, the lids on theseparation surface are respectively detached from the maintenance unit10 a or 10 c on the movement mechanism 60 and the irregular maintenanceunit 10 b or 10 d remaining at the projection optics 20 side. Then, themaintenance unit 10 a or 10 c is moved by the movement mechanism 60 tothe irregular maintenance unit 10 b or 10 d side, and the maintenanceunit 10 a or 10 c is positioned in the predetermined location where theoptical axis of the EUV light is aligned with the optical axis of theprojection optics 20 by the positioning mechanism 70. Then, themaintenance unit 10 a or 10 c and the irregular maintenance unit 10 b or10 d are united, clamped by bolts, clamp, or the like, and sealed. Then,the interior of the chamber 10 is evacuated by the vacuum evacuationpump.

The invention claimed is:
 1. An extreme ultraviolet light sourceapparatus for generating plasma by applying a laser beam to a targetmaterial and entering extreme ultraviolet light radiated from the plasmainto projection optics of exposure equipment, said apparatus comprising:a chamber in which the extreme ultraviolet light is generated; a targetsupply unit for supplying the target material into said chamber; adriver laser for applying the laser beam to the target material suppliedby said target supply unit to generate the plasma; a collector mirrorfor collecting the extreme ultraviolet light radiated from the plasma; apositioning mechanism for positioning at least a part of said chamber ina predetermined location where an optical axis of the collected extremeultraviolet light and an optical axis of the projection optics of saidexposure equipment are aligned with each other; a movement mechanism formoving at least the part of said chamber positioned in the predeterminedlocation between said predetermined location and a maintenance area; anda magnetic field generating unit includes a pair of magnets placedopposite to each other for trapping charged particles radiated from saidplasma, said magnetic field generating unit being provided outside of atrack on which at least the part of said chamber moves between saidpredetermined location and said maintenance area.
 2. The extremeultraviolet light source apparatus according to claim 1, wherein thepair of magnets are placed opposite to each other such that a magneticfield direction is along a horizontal direction.
 3. The extremeultraviolet light source apparatus according to claim 1, wherein themovement mechanism moves the chamber toward a direction crossing amagnetic field direction generated by the pair of magnets.
 4. Theextreme ultraviolet light source apparatus according to claim 3, whereinthe direction is perpendicular relative to the magnetic field direction.5. The extreme ultraviolet light source apparatus according to claim 3,wherein the movement mechanism includes a bearing.
 6. The extremeultraviolet light source apparatus according to claim 1, wherein thechamber is disposed to align an optical axis of the EUV light sourceapparatus with an optical axis of the exposure equipment.
 7. The extremeultraviolet light source apparatus according to claim 6, wherein theoptical axis of the EUV light source apparatus is aligned with theoptical axis of the exposure equipment when the chamber is placed in thelocation.
 8. The extreme ultraviolet light source apparatus according toclaim 1, further comprising a fixing member configured to fix thechamber.
 9. An extreme ultraviolet (EUV) light source apparatusconfigured to generate plasma by applying a laser beam to a targetmaterial and entering extreme ultraviolet light radiated from the plasmainto projection optics of exposure equipment, said apparatus comprising:a chamber in which the extreme ultraviolet light is generated at aplasma emission point disposed to a location between a pair of magnets;a movement mechanism for moving at least a part of said chamberpositioned in a predetermined location between said predeterminedlocation and a maintenance area, the predetermined location configuredto be where an optical axis of collected extreme ultraviolet light andan optical axis of the projection optics of said exposure equipment arealigned with each other; and a magnetic field generating unit configuredto include the pair of magnets placed opposite to each other fortrapping charged particles radiated from said plasma, said magneticfield generating unit being provided outside of a track on which atleast the part of said chamber moves between said predetermined locationand said maintenance area.
 10. The extreme ultraviolet light sourceapparatus according to claim 9, wherein the pair of magnets are placedopposite to each other such that a magnetic field direction is along ahorizontal direction.
 11. The extreme ultraviolet light source apparatusaccording to claim 9, wherein the movement mechanism moves the chambertoward a direction crossing to a magnetic field direction generated bythe pair of magnets.
 12. The extreme ultraviolet light source apparatusaccording to claim 11, wherein the direction is perpendicular relativeto the magnetic field direction.
 13. The extreme ultraviolet lightsource apparatus according to claim 11, wherein the movement mechanismincludes a bearing.
 14. The extreme ultraviolet light source apparatusaccording to claim 9, wherein the chamber is disposed to align anoptical axis of the EUV light source apparatus with an optical axis ofthe exposure equipment.
 15. The extreme ultraviolet light sourceapparatus according to claim 14, wherein the optical axis of the EUVlight source apparatus is aligned with the optical axis of the exposureequipment when the chamber is placed in the location.
 16. The extremeultraviolet light source apparatus according to claim 9, furthercomprising a positioning mechanism configured to position the chamber.17. The extreme ultraviolet light source apparatus according to claim16, wherein the positioning mechanism restricts the chamber from movingto the exposure equipment.
 18. The extreme ultraviolet light sourceapparatus according to claim 9, further comprising a fixing memberconfigured to fix the chamber.
 19. The extreme ultraviolet light sourceapparatus according to claim 18, wherein the fixing member restricts thechamber from moving to an opposite direction of the exposure equipment.20. The extreme ultraviolet light source apparatus according to claim 9,wherein the pair of magnets are superconducting electromagnets.
 21. Theextreme ultraviolet light source apparatus according to claim 9, whereinthe pair of magnets are placed so that a magnetic field generated by thepair of magnets contains the plasma emission point.
 22. The extremeultraviolet light source apparatus according to claim 21, furthercomprising a magnet fixing stages configured to fix the pair of magnetsso that the magnetic field contains the plasma emission point.
 23. Theextreme ultraviolet light source apparatus according to claim 9, furthercomprising an evacuation pump placed outside the track on which thechamber is moved by the movement mechanism.